Demcon | Pulsed Laser Deposition

We specialize in creating tailor-made Pulsed Laser Deposition (PLD) equipment that meets the specific needs of our clients. Our systems are designed to deliver top-notch flexibility for RHEED (Reflection High-Energy Electron Diffraction) studies, allowing precise control over deposition parameters. Whether you're working with intricate oxide materials or conducting thin-film research, our solutions provide reliable results with high reproducibility. Trusted across various industries, our systems are optimized for both small and large sample sizes, making them a versatile choice for material research and development at the atomic scale.

Controlled Process :

Pulsed Laser Deposition (PLD) uses a powerful laser pulse to vaporize material, which is then deposited as a layer (thin film) on a substrate. This process can occur in an ultra-high vacuum to avoid contamination, or with gases like oxygen to form oxides. Leveraging our expertise in mechatronics, PLD, and vacuum technology, we develop and manufacture top-quality PLD systems.

High-quality, Uniform Layers :

We provide PLD equipment and accessories to research centers worldwide. In addition, we collaborate on scientific research, offer substrate treatments, and support knowledge transfer on thin film growth. We're also committed to innovation, with one of our latest advancements being an in-situ atomic force microscope, which allows us to study material properties at the atomic level during deposition processes.

Features :

• Sample Heating And Manipulation :

Depending on sample size and temperature requirements we offer:

• Laser heating
• Resistive heating
• Radiation heating
• Direct current heating

Sample size up to 4" wafers, sample temperature up to 1100C.

Heater stages have up to five degrees of freedom of movement to ensure maximum sample alignment flexibility for RHEED studies. All heating solutions are compatible with high oxygen pressure environment.

• Target Handling :
• Target stages handle up to 6 targets and have XYZ manipulation, scanning the target surface with respect to the ablation spot.
• Scanning patterns are controlled by the software, allowing ablation from odd-shaped targets of any size.
• Target scanning instead of spinning ensures the lowest vibrations and lowest outgassing conditions.

• Laser Beam Delivery :

Key in PLD, with a flexible layout, individual and optimal control and quick adjustability of all necessary laser parameters such as fluence, repetition rate and spotsize is ensured, standard in class 1 safety conditions. Full interlock possibilities available.

• Pressure And Gas Handling :

TSST systems have a base pressure below 10-8 mbar, with true UHV upgrade possibilities. Process pressure is regulated either manually or with automated upstream and downstream control, which combines fast pressure set-point control with vibration limiting conditions. All systems have high-pressure, post-anneal possibilities.

• Wafer Scale PLD :

TSST offers PLD system solutions for the growth of high quality materials on larger, wafer scale area of up to 4".

This unique solution offers all flexibility and growth parameter range similar to "small scale" PLD solution. A perfect tool for investigating growth on larger areas and growing on demonstrator platforms.

• Sputtering, Evaporation, Ion Sources And More :

It is often preferred to combine other deposition techniques with PLD, such as sputtering, evaporation, in combination with ion sources, for the growth of specific material systems and heterostructures. TSST is highly experienced in the integration of these techniques, either combined in one vacuum chamber, or through a separate dedicated chamber in user-friendly cluster geometries.

• Loadlock for Sample And Target Transfer :

To guarantee high vacuum quality, the system can be equipped with a loadlock for sample and target carrousel transfer, with heater and target storage possibilities.

• Reflective High Energy Electron Diffraction (RHEED) :

TSST PLD systems have been optimized for the best RHEED studies.

With high pressure RHEED (Reflection High-Energy Electron Diffraction), single monolayer growth can be monitored and controlled in a typical PLD process environment.

Highlights :

• Single monolayer growth control with RHEED
• Down to 5.0×10-10 mbar base pressure
• Up to 1100°C growth temperature
• Integration of other PVD techniques
• Remote support, service and on site training by TSST engineers

PLD systems and components :

Customized design and integration : Systems are adapted and integrated to existing beam lines, characterization tools and cluster setups, compatible with standard sample platforms such as flagstyle sample plates. We are experienced with the integration of other deposition equipment in a PLD system solution, including sputtering, evaporators and ion sources.

Customized cluster setups : One laser, multiple systems, PLD combined with other PVD systems.

Combinatorial Growth :